JPH0532925B2 - - Google Patents

Info

Publication number
JPH0532925B2
JPH0532925B2 JP12400683A JP12400683A JPH0532925B2 JP H0532925 B2 JPH0532925 B2 JP H0532925B2 JP 12400683 A JP12400683 A JP 12400683A JP 12400683 A JP12400683 A JP 12400683A JP H0532925 B2 JPH0532925 B2 JP H0532925B2
Authority
JP
Japan
Prior art keywords
thin film
piezoelectric
vibrator
film
piezoelectric thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12400683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6016010A (ja
Inventor
Takeshi Inoe
Yoichi Myasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP12400683A priority Critical patent/JPS6016010A/ja
Publication of JPS6016010A publication Critical patent/JPS6016010A/ja
Publication of JPH0532925B2 publication Critical patent/JPH0532925B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/58—Multiple crystal filters
    • H03H9/582—Multiple crystal filters implemented with thin-film techniques
    • H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/588—Membranes
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/174—Membranes

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP12400683A 1983-07-07 1983-07-07 圧電薄膜複合振動子 Granted JPS6016010A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12400683A JPS6016010A (ja) 1983-07-07 1983-07-07 圧電薄膜複合振動子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12400683A JPS6016010A (ja) 1983-07-07 1983-07-07 圧電薄膜複合振動子

Publications (2)

Publication Number Publication Date
JPS6016010A JPS6016010A (ja) 1985-01-26
JPH0532925B2 true JPH0532925B2 (en]) 1993-05-18

Family

ID=14874695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12400683A Granted JPS6016010A (ja) 1983-07-07 1983-07-07 圧電薄膜複合振動子

Country Status (1)

Country Link
JP (1) JPS6016010A (en])

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000196404A (ja) * 1998-12-25 2000-07-14 Kyocera Corp 圧電共振子
JP2001203558A (ja) * 1999-11-11 2001-07-27 Murata Mfg Co Ltd 圧電共振子、フィルタ及び電子機器
JP2001211053A (ja) * 1999-11-17 2001-08-03 Murata Mfg Co Ltd 圧電共振子、電子部品及び電子機器
JP2002299979A (ja) * 2001-03-05 2002-10-11 Agilent Technol Inc 共振器の製造方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3531522B2 (ja) * 1999-04-19 2004-05-31 株式会社村田製作所 圧電共振子
JP4633248B2 (ja) * 2000-12-12 2011-02-16 東芝プラントシステム株式会社 締付けボルト緩み防止装置
DE10200741A1 (de) 2002-01-11 2003-07-24 Infineon Technologies Ag Verfahren zur Herstellung einer topologieoptimierten Elektrode für einen Resonator in Dünnfilmtechnologie
US7391285B2 (en) * 2003-10-30 2008-06-24 Avago Technologies Wireless Ip Pte Ltd Film acoustically-coupled transformer
JP2006203304A (ja) * 2005-01-18 2006-08-03 Hitachi Media Electoronics Co Ltd 圧電薄膜共振器及びそれを用いた発振器並びにそれを内蔵した半導体集積回路
US7561009B2 (en) * 2005-11-30 2009-07-14 Avago Technologies General Ip (Singapore) Pte. Ltd. Film bulk acoustic resonator (FBAR) devices with temperature compensation
US9479139B2 (en) * 2010-04-29 2016-10-25 Avago Technologies General Ip (Singapore) Pte. Ltd. Resonator device including electrode with buried temperature compensating layer
US9197185B2 (en) 2010-04-29 2015-11-24 Avago Technologies General Ip (Singapore) Pte. Ltd. Resonator device including electrodes with buried temperature compensating layers
US9748918B2 (en) 2013-02-14 2017-08-29 Avago Technologies General Ip (Singapore) Pte. Ltd. Acoustic resonator comprising integrated structures for improved performance
US9444426B2 (en) * 2012-10-25 2016-09-13 Avago Technologies General Ip (Singapore) Pte. Ltd. Accoustic resonator having integrated lateral feature and temperature compensation feature
JP5792554B2 (ja) * 2011-08-09 2015-10-14 太陽誘電株式会社 弾性波デバイス
US8941286B2 (en) 2012-02-14 2015-01-27 Taiyo Yuden Co., Ltd. Acoustic wave device
JP6085147B2 (ja) 2012-11-15 2017-02-22 太陽誘電株式会社 弾性波デバイスおよびその製造方法
JP6185292B2 (ja) 2013-06-10 2017-08-23 太陽誘電株式会社 弾性波デバイス

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000196404A (ja) * 1998-12-25 2000-07-14 Kyocera Corp 圧電共振子
JP2001203558A (ja) * 1999-11-11 2001-07-27 Murata Mfg Co Ltd 圧電共振子、フィルタ及び電子機器
JP2001211053A (ja) * 1999-11-17 2001-08-03 Murata Mfg Co Ltd 圧電共振子、電子部品及び電子機器
JP2002299979A (ja) * 2001-03-05 2002-10-11 Agilent Technol Inc 共振器の製造方法

Also Published As

Publication number Publication date
JPS6016010A (ja) 1985-01-26

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